Because of the versatility of his approach can be used with a wide range of ions suitable for the task at hand, is expected to have wide application in nanotechnology, both for smaller size of semiconductor features that are possible and non-destructive Image nanoscale structures with better resolution than is currently possible with electron microscopes.
Researchers and manufacturers routinely using intense beams of focused ion carving nanometer-sized features in a wide variety of targets. In principle, ion beams could also produce the best images of nanoscale surface features than conventional electron microscopy. But current technology is problematic for both uses.